Customization: | Available |
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CAS No.: | 999-97-3 |
Formula: | C6h19nsi2 |
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Hexamethyldisilazane Chemical Properties |
Melting point | -78 °C |
Boiling point | 125 °C (lit.) |
density | 0.774 g/mL at 25 °C(lit.) |
vapor density | 4.6 (vs air) |
vapor pressure | 20 hPa (20 °C) |
refractive index | n20/D 1.407(lit.) |
Fp | 57.2 °F |
storage temp. | Store below +30°C. |
solubility | Miscible with acetone, benzene, ethyl ether, heptane and perchloroethylene. |
pka | 30(at 25ºC) |
form | Liquid |
Specific Gravity | 0.774 |
color | Colorless |
Odor | Ammonia odour |
PH Range | 8.5 |
Safety Information |
Hazard Codes | F,C,Xn |
Risk Statements | 11-20/21/22-34-52/53 |
Safety Statements | 16-26-36/37/39-45-61 |
RIDADR | UN 3286 3/PG 2 |
WGK Germany | 2 |
RTECS | JM9230000 |
F | 21 |
Autoignition Temperature | 325 °C |
Hazard Note | Flammable |
TSCA | Yes |
HS Code | 2931 90 00 |
HazardClass | 3 |
PackingGroup | II |
Hexamethyldisilazane mainly used as methyl silane alkylation (such as amikacin, penicillin, cephalosporins and kinds of penicillin derivatives), hydroxyl protectants of antibiotics. It is used as surface treatment agent of diatomite, white carbon black, titanium and blond additives of photoresist in the semiconductor industry. It is used as treatment agent of tearing strength resistance. It is used as a solvent in organic synthesis and organometallic chemistry. It is used as an adhesion promoter for photoresist in photolithography. it is used for the preparation of trimethylsilyl ethers from hydroxy compounds. It is used as an alternative to critical point drying during sample preparation in electron microscopy. It is added to analyte to get silylated diagnostic products during pyrolysis in gas chromatography- mass spectrometry.
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